http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012069724-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
filingDate 2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81d6ae600d39e259c0ccbaeb2aaf3a74
publicationDate 2012-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012069724-A
titleOfInvention Substrate processing apparatus and substrate processing method
abstract An object of the present invention is to increase the number of substrates that can be accommodated in a reaction container while reducing maintenance processing of the reaction container. A plurality of carbon columns 234 are provided on the outer peripheral side of a boat 217 in a processing furnace 202 so as to extend in the stacking direction of each wafer 200 and to form a predetermined gap in the circumferential direction of each wafer 200. The carbon support 234 is induction-heated by the induction heating device 206, and each wafer 200 is heated by the radiant heat from each carbon support 234. Therefore, the number of wafers 200 that can be stored in the processing furnace 202 can be increased while the substrate processing apparatus 101 is of a cold wall type. Compared to a hot wall type substrate processing apparatus, the entire interior of the processing furnace 202 does not need to be heated to the processing temperature, so that the formation of a semiconductor film on the inner wall or the like of the outer tube 205 is suppressed. Maintenance processing of the processing furnace 202 can be reduced. [Selection] Figure 4
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112768385-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109411388-A
priorityDate 2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.