| abstract |
Kind Code: A1 The present invention relates to a method for pattern formation of a layer including a block copolymer, which can produce a substrate having nanostructures with more freely designed positions and orientations on the substrate surface using phase separation of the block copolymer. Provided. A step (1) of applying a base material containing a resin component having a structural unit derived from an aromatic ring-containing monomer on a substrate 1 to form a layer 2 made of the base agent, and a plurality of types of polymers Step (2) of forming a layer 3 containing a block copolymer to which is bonded on the surface of the layer made of the base material 2 and then phase-separating the layer 3 containing the block copolymer, and among the layers 3 containing the block copolymer, A step (3) of selectively removing the phase 3a composed of at least one of a plurality of types of polymers constituting the block copolymer, and a method for forming a pattern of a layer containing the block copolymer, . [Selection] Figure 1 |