| abstract |
A multilayer three-dimensional structure is formed based on the charging of both a constituent material and a sacrificial material. A first article (4a) including a mask (6) and a support (8) is brought into contact with a substrate (2) to be plated, and a first metal (for example, a sacrificial metal) is present in a state where a first metal ion source is present. ) 12, the second article 14 including the mask 16 and the support 18 is brought into contact with the substrate 2, and in the presence of the second metal ion source, a second metal (for example, a constituent metal) 20. And planarize the layer. And the above-mentioned method is repeated using the electroplating articles 4a, 4b, 14a, and 14b of different patterns, and the multilayer structure 24 is produced | generated. The element 26 is obtained by etching all of the sacrificial metal 12. [Selection] Figure 11 |