| abstract |
High sensitivity, high resolution, low roughness (LWR) and good pattern shape after exposure, and a high molecular compound suitable as a base resin for a chemically amplified positive resist material, particularly a chemically amplified positive resist material An object is to provide a positive resist material and a pattern forming method. The weight average molecular weight is at least 1 and includes a repeating unit a having a group represented by the following general formula (1) and a repeating unit b in which a hydrogen atom of a carboxyl group is substituted with an acid labile group. A positive resist material comprising a polymer compound of 1,000,000 to 500,000 as a base resin. [Chemical 1] [Selection figure] None |