| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7af673589ca45d2fd8b9ea902cdbd1dc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2203-033 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66734
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0634 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47e0542e26fefc96611d66706280c68a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_945e8dfb8c8b3869f25d15bcee3ca445 |
| publicationDate |
2012-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012023339-A |
| titleOfInvention |
Manufacturing method of semiconductor device |
| abstract |
A method of manufacturing a semiconductor device having a cleaning process capable of reliably cleaning the inside of a trench to the bottom of the trench with low damage is provided. As a chemical solution 5 in a cleaning process after forming a trench 3, a mixed solution of hydrogen peroxide water, ammonia water and water to which a chelating agent is added is used. As a result, it is possible to reliably perform cleaning up to the bottom of the trench 3 without applying an external force such as ultrasonic waves. Since such a cleaning process can be performed, even if the trench 3 having an aspect ratio of 5 or more is formed, the foreign matter including the protective film 4 can be reliably removed to the bottom of the trench 3. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9250534-B2 |
| priorityDate |
2010-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |