http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012015352-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beca91ff2b431c30c2f2347bc402ca8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fc07e426e44dc80b47bdc8eeaa2f95a |
| publicationDate | 2012-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012015352-A |
| titleOfInvention | Polishing liquid for CMP and polishing method using this polishing liquid |
| abstract | Provided are a CMP polishing liquid and a polishing method capable of achieving a high polishing rate for a low-k film as an interlayer insulating film layer while maintaining a good polishing rate for a barrier metal of a barrier layer and silicon dioxide of a cap layer. To do. A polishing slurry for CMP comprising: (A) a compound having an alkylbenzene sulfonic acid structure; (B) abrasive particles having a positive charge; (C) a metal oxide solubilizing agent; and (D) an oxidizing agent. Is used. Polishing includes an interlayer insulating film having raised portions and groove portions on the surface, a barrier layer 2 provided following the surface of the interlayer insulating film, and a conductive material layer provided so as to cover the barrier layer 2 A first polishing step for polishing the conductive material layer in the substrate having the above structure to expose the barrier layer 2 located on the raised portion of the interlayer insulating film, and the barrier layer 2 exposed by the first polishing step. And a second polishing step for exposing the raised portions of the interlayer insulating film by polishing using a CMP polishing liquid. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11643573-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022107217-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7220532-B2 |
| priorityDate | 2010-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 277.