| titleOfInvention |
Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device |
| abstract |
[PROBLEMS] To form a pattern having excellent weather resistance with high appropriate sensitivity, low refractive index, few chippings and residues after development, small change in refractive index under high temperature and high humidity. Provided are a photosensitive composition, a pattern forming material, a photosensitive film using the same, a pattern forming method, a pattern film, a low refractive index film, an optical device, and a solid-state imaging device. A photosensitive material comprising (A) hollow or porous particles, (B) a compound that generates active species upon irradiation with actinic rays or radiation, and the following resin (C1) or mixed resin (C2). Composition, pattern forming material, photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device. (C1) Resin that contains silicon atoms or fluorine atoms in the side chain and changes in solubility in an alkali developer by the action of the active species (C2) Resin that contains silicon atoms or fluorine atoms in the side chain (C2-1) ) And a resin (C2-2) whose solubility in an alkaline developer is changed by the action of the active species [Selection] None |