http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012013948-A

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filingDate 2010-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e404b9b35ba2a71645ce3b724f193ee
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publicationDate 2012-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012013948-A
titleOfInvention Half mirror substrate manufacturing method and half mirror substrate
abstract PROBLEM TO BE SOLVED: To provide a half mirror substrate manufacturing method and a half mirror substrate capable of suppressing the occurrence of warp without reducing the light reflectance. A half mirror substrate 1 of this embodiment includes a PMMA substrate 10 and a reflective film layer 30 formed on the back surface of the PMMA substrate 10. The reflective film layer 30 includes a metal reflective film (Sn film 31) formed on the surface of the PMMA substrate 10 and a protective film (SiO film 32) formed so as to cover the Sn film 31. An Sn oxide layer 33 containing SnO 2 as a main component is formed on the surface of the Sn film 31. The SiO film 32 has a low water vapor barrier property. [Selection] Figure 3
priorityDate 2010-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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