| abstract |
The present invention includes the following steps: a) a step of forming a metal aggregate (3) on the metal oxide substrate (2); and b) a metal oxidation in which the nanostructure (1) is coated with the metal aggregate. A step of vapor growth on the physical substrate (2), wherein the substrate is heated in the presence of one or more precursor gases, and the vapor growth of the nanostructure (1) is catalyzed by the metal aggregate (3). The present invention also relates to a method for producing a nanostructure (1) on a metal oxide substrate (2). According to the present invention, the formation step a) of the metal agglomerate reduces the surface of the metal oxide substrate by reducing plasma treatment, and drops of metal agglomerate (3) on the substrate (2). The metal agglomerate formation step a) and the nanostructure growth step b) are successively performed in a single shared plasma reactor chamber (4), and the nanostructure growth is performed. Directly on the droplets of metal agglomerates (3). [Selection] Figure 3 |