| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65H2301-51214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-543
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02628 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0749
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1291
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1204
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1279
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-03928
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65H20-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C24-10 |
| filingDate |
2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2011-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011518942-A |
| titleOfInvention |
Improved solution deposition assembly |
| abstract |
Methods and apparatus are provided for an improved deposition system. In one embodiment of the present invention, a deposition system is provided with a solution and a substrate. The system includes a solution deposition apparatus; at least one heating chamber; at least one assembly for holding the solution on the substrate; and at least one end of the substrate to bend and a large amount of solution on the substrate. Includes an instrument for bending the substrate to define an area capable of accommodating. In another embodiment of the invention, with a substrate, including a solution deposition apparatus; at least one heating chamber; and an assembly for holding the solution on the substrate, allowing a depth of at least about 0.5 μm to 10 mm It can have a vapor deposition system for use. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014519712-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013012703-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021510011-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016517182-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015514323-A |
| priorityDate |
2007-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |