http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011508254-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B27-0006 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2008-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011508254-A |
| titleOfInvention | Method for forming an image on a photoresist coated on an antireflective coating |
| abstract | The method of the present invention comprises: a) forming an anti-reflective coating film from the anti-reflective coating composition, wherein the composition comprises a siloxane polymer, b) treating the anti-reflective film with an aqueous alkaline processing liquid, and c) treating Rinsing the antireflective film with an aqueous rinsing solution, d) forming a coating of photoresist on the film of the antireflective coating composition, e) exposing the photoresist film imagewise, and f) removing the photoresist. The present invention relates to a method of forming an image on a photoresist coated on an antireflective coating film, comprising developing with an aqueous alkaline developer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014197668-A |
| priorityDate | 2007-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 153.