http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011504606-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 |
| filingDate | 2008-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011504606-A |
| titleOfInvention | Photoresist composition and multi-exposure method using multilayer photoresist system |
| abstract | A photoresist composition and a method of using the photoresist composition in a multiple exposure / multi-layer process. The photoresist composition includes a polymer including a repeating unit having a hydroxyl moiety, a photoacid generator, and a solvent. When formed on a substrate, the polymer is substantially insoluble in the solvent after heating to a temperature of about 150 ° C. or higher. One method is to form a first photoresist layer (120) on a substrate (110), exposing the first photoresist layer in a pattern, and then on the substrate and the first patterned photoresist layer (120A). Forming a second non-photoresist layer thereon. Alternatively, a first photoresist layer (120) is formed on the substrate (110), the first photoresist layer is exposed in a pattern, and the substrate and the first patterned photoresist layer (120A) are exposed. Forming a second photoresist layer (130) thereon and exposing the second photoresist layer in a pattern. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010096992-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011508246-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017500754-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5445454-B2 |
| priorityDate | 2007-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 90.