http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011501434-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2008-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011501434-A |
| titleOfInvention | Apparatus and method for optimizing pattern substrate cleaning |
| abstract | 【Task】 A method and apparatus for cleaning a wafer surface, particularly a patterned wafer surface, is provided. The cleaning apparatus includes a cleaning head having a channel on a surface facing a patterned wafer having a dominant pattern. The cleaning material flowing in the channel exerts a shearing force on the surface of the pattern wafer disposed in a specific direction with respect to the cleaning head. The shear force and the specific orientation between the patterned wafer and the cleaning head improve the efficiency of removing surface contaminants. [Selection] 5D |
| priorityDate | 2007-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.