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filingDate 2010-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f253b8854d1fa42dabfec6659e94702a
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publicationDate 2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011230034-A
titleOfInvention Rotary atomizing head cleaning apparatus and method
abstract An object of the present invention is to provide a cleaning technique that does not cause the cleaning liquid to scatter to the main body of the coating machine when the outer surface of the rotary atomizing head is cleaned. In a rotary atomizing head cleaning device for cleaning a rear surface of a rotary atomizing head, a liquid supply pipe to which a cleaning liquid is supplied extends to the rear surface of the rotary atomizing head. The liquid supply pipe 26 is provided with a discharge hole (details will be described later) for discharging the cleaning liquid to the rear surface 25 of the rotary atomizing head 19, and a center line 43 of the discharge hole is hung on the rear surface 25. [Effect] Since the discharge hole of the cleaning liquid is near the rear surface of the rotary atomizing head, it can be discharged so that the cleaning liquid does not scatter. There is no worry to do. [Selection] Figure 3
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