http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011227416-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
filingDate | 2010-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fee400e09af20d57fe0613da970fc514 |
publicationDate | 2011-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2011227416-A |
titleOfInvention | Resist pattern forming method and plating pattern forming method using chemically amplified positive resist material |
abstract | (I) a step of applying a chemically amplified positive resist material containing the following components (A) to (C) to a substrate to form a resist layer; (A) High molecular weight compound of Mw 1,000 to 500,000 having a repeating unit of hydroxystyrene unit, p-amyloxystyrene compound unit, and / or styrene compound unit, and / or alkyl (meth) acrylate single unit , (B) a photoacid generator, (C) an azobenzene structure-containing compound, (Ii) a step of exposing to radiation or an electron beam through a photomask after the heat treatment; (Iii) A resist pattern forming method including a step of developing after heat treatment, and having a pattern side wall having an angle surface of 70 ° or more and less than 87 ° with respect to the substrate surface in the cross-sectional pattern shape after development. [Effect] It is possible to form a resist pattern having high storage stability, process adaptability, excellent pattern side wall angle control performance, and high resolution and electroplating resistance. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190087545-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015184389-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107342374-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9017928-B2 |
priorityDate | 2010-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 616.