http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011222860-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1347d9c8ff78439fafe12842a5b9afe3
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
filingDate 2010-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74223f75decd120be7784cb91a1d99e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93e92195735d7890c5fe53f7e798a920
publicationDate 2011-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011222860-A
titleOfInvention Plasma oxidation method and plasma oxidation apparatus
abstract The present invention provides a plasma oxidation method and apparatus capable of increasing the oxidation rate even when the substrate temperature is low, enabling oxidation at low temperature and enabling thick film oxidation. An oxygen-containing plasma is generated with a process gas containing oxygen, a bias voltage is applied from a transformer-coupled bias power source to a substrate 16 placed on a stage 18, and the maximum bias potential of the substrate 16 is applied. By controlling the bias potential such that Vmax and the minimum value Vmin satisfy the relationship of Vmin <Vp <Vmax with respect to the plasma potential Vp, positive ions and negative ions in the oxygen-containing plasma are applied to the substrate 16. The substrate 16 is plasma oxidized by the plasma processing apparatus 10 to be irradiated. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7313929-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7349910-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021132344-A1
priorityDate 2010-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05160112-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002280369-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002033381-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08203869-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009111378-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804

Total number of triples: 27.