http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011215613-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2011-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2be8c1d8302d6fb84663820906c7f02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_811c9e6e856f6d34daba788e2d6e8199 |
publicationDate | 2011-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2011215613-A |
titleOfInvention | Resist composition |
abstract | A resist composition capable of forming a resist pattern having excellent line edge roughness is provided. A resist composition comprising a resin comprising a structural unit represented by formula (I) and a structural unit represented by formula (II), and an acid generator. [A 1 represents a single bond, —O— or —CO—. A 2 represents an alkylene group having 1 to 6 carbon atoms. R 6 is a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 4 carbon atoms, an acyloxy group having 2 to 4 carbon atoms, an acryloyl group or a methacryloyl group. Represents. ma represents an integer of 0 to 4. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9513549-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016079235-A |
priorityDate | 2010-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 287.