http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011203708-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2010-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f1bc73deb335da3a254262ee1090eb5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f2053be723a5329e3d7a9c3d3aa07f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68ce1787ebf0b42416898d6cb1bca0c8 |
| publicationDate | 2011-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011203708-A |
| titleOfInvention | Negative resist composition, method for producing relief pattern using the resist composition, and method for producing photomask |
| abstract | A negative resist composition capable of achieving high sensitivity, excellent pattern shape, and stability over time in pattern formation by light irradiation of an electron beam or the like, and a relief pattern using the negative resist composition And a photomask manufacturing method using the negative resist composition. An alkali-soluble resin, an acid generator that generates an acid upon irradiation with an electron beam, a melamine resin containing a hexaalkoxymethylmelamine monomer, and a basic compound, wherein the alkali-soluble resin has a concentration of 2 The development rate for a 38 wt% tetramethylammonium hydroxide (TMAH) aqueous solution (aqueous solution temperature 23 ° C.) is 10 to 80 nm / sec, and the basic compound is benzimidazole, tribenzylamine, and It is a negative resist composition that is at least one selected from the group consisting of derivatives having specific substituents. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020202329-A1 |
| priorityDate | 2010-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 148.