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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
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filingDate 2010-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c372ff05956379bf96e5bfd038daf378
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publicationDate 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011199105-A
titleOfInvention Manufacturing method of semiconductor device
abstract A semiconductor device manufacturing method capable of growing an epitaxial crystal having good crystallinity on a semiconductor layer. A method of manufacturing a semiconductor device includes forming nanowires 14 extending in a predetermined direction from a precursor film formed on a semiconductor substrate 10 via an insulating film, and forming gates on both side surfaces and upper surfaces of the formed nanowires 14. A gate electrode 18 is formed so as to cross a predetermined direction of the nanowire 14 through an insulating film, gate sidewalls 22 are formed on both side surfaces of the formed gate electrode 18, and the nanowire 14 exposed after the formation of the gate sidewall 22 is formed. It includes growing an epitaxial crystal on the surface to form an epitaxial layer 24, forming the epitaxial layer 24, and then introducing impurities into the nanowire 14 to form an extension region. [Selection] Figure 2B
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018537867-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017505986-A
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Total number of triples: 26.