http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011195778-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-73204
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-10253
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J163-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29
filingDate 2010-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6676acb826e82e48899dd73b5e127908
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6542bb7a0e2a09022a466ede6627fdff
publicationDate 2011-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011195778-A
titleOfInvention Polymerization curing agent and method for producing the same, resin composition, adhesive for semiconductor, and semiconductor device
abstract A polymerized curing agent capable of improving the degree of freedom of material selection and capable of suppressing generation of voids in the manufacture of a semiconductor device that requires a high-temperature heating process, and a method for manufacturing the same, A resin composition, a semiconductor adhesive, and a semiconductor device are provided. The polymerized curing agent of the present invention is obtained by the reaction of (A) an epoxy resin and (B) a curing agent, and the amount of thermal weight loss of the polymerized curing agent of the present invention is (A) epoxy. It is 10% or less at a temperature at which the thermal weight loss of at least one of the resin or (B) curing agent is greater than 10%. In the method for producing a polymeric curing agent of the present invention, the thermal weight reduction amount of the polymeric curing agent is such that the thermal weight reduction amount of at least one of (A) the epoxy resin or (B) curing agent is greater than 10%. (A) The epoxy resin and (B) the curing agent are reacted so that the temperature is 10% or less. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014136761-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013145840-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6596611-B1
priorityDate 2010-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06100763-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H083529-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004063992-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009117811-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002329966-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006008854-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0337220-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008247974-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID446284
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6966
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83648
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415744893
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID75498
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414860340
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70012
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557764
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411029818
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415777653
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419475434
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448794171
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526217
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83658
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415777488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456367111
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16213786
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID423461817
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546850
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID109115
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415756990
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415777387
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10614
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410078110
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66842551
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409588443
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11138
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6455998
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83699
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415813506
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414972214
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16204948
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9831062
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452373511
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID795
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425334797
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3015939
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31170
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69591
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90326
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451476591
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10465
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID424598054
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414172096
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415788457
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID427803462
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457444288
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID445580
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID164912
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426223290
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID86645333
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54195708
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160901052
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID67050895
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452745756
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452244850

Total number of triples: 86.