| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0641
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-211 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-447
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J4-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-00 |
| filingDate |
2011-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ae361574345a5e91c2c0437a4aa116c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_193a81412b7708b2e0ba55ab456c8537
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f84471357bfcd61e74cc03e1115e30c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7de9ef11601ea969ce9811ff13b06f5 |
| publicationDate |
2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011191311-A |
| titleOfInvention |
Surface characteristic analysis system with self-calibration function |
| abstract |
An ellipsometer with a self-calibration function is provided for a system for measuring surface properties of a sample such as a semiconductor. Two phase modulators or polarizing elements are used to modulate the polarization of the beam before and after irradiating the sample with a query radiation beam. Modulated radiation from the sample is detected and harmonics to the analyzer 26 are derived from the detected signal. The harmonics up to the analyzer 26 can be used to derive ellipsometric and system parameters such as fixed polarization element, circular attenuation compensation, depolarization of the polarization element and retardance of the phase modulator. Self-calibrating ellipsometers and combination systems can be used to measure sample properties such as film thickness and depolarization of radiation caused by the sample. [Selection] Figure 1 |
| priorityDate |
1999-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |