http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011168485-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06 |
| filingDate | 2011-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85b8224704029d7cfae0468f5eea015b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_396dfdb2642f18d19f8d017bb1e6ced1 |
| publicationDate | 2011-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011168485-A |
| titleOfInvention | Silica glass containing TiO2 and method for producing the same |
| abstract | A method for producing silica glass containing TiO 2 having a coefficient of thermal expansion of almost zero over a wide temperature range is provided. A method for producing silica glass containing TiO 2 , comprising: (a) depositing silica glass fine particles obtained by flame hydrolysis of a Si precursor and a Ti precursor, which are glass forming raw materials, on a substrate; A step of growing to form a porous glass body; (b) a step of heating the porous glass body to a transparent vitrification temperature to obtain a transparent glass body; and (c) a transparent glass body at a softening point or higher. A step of obtaining a molded glass body by heating to a temperature of 5 ° C., and (d) holding the molded glass body at a temperature exceeding 500 ° C. for 5 hours or more and then up to 500 ° C. at 10 ° C./hr or less. An annealing process for lowering the temperature at an average temperature lowering rate. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013084978-A1 |
| priorityDate | 2003-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.