Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2010-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670712e4c98df4c464bc1ac57747e207 |
publicationDate |
2011-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2011148985-A |
titleOfInvention |
Resin, photoresist composition and method for producing resist pattern |
abstract |
A resin for a photoresist composition capable of forming a pattern having an excellent exposure margin is provided. A resin comprising a resin having a structural unit derived from a compound represented by formula (I) and a structural unit derived from a compound represented by formula (II). [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012150166-A |
priorityDate |
2009-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |