http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011137075-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-32 |
| filingDate | 2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a03184ec618c24579fb4a54875ec7293 |
| publicationDate | 2011-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011137075-A |
| titleOfInvention | Photosensitive resin composition and cured product thereof |
| abstract | Provided is a photosensitive resin composition capable of forming a cured product excellent in solvent resistance and sensitivity to a photoacid generator. In the present invention, an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride (a1), an aliphatic polycyclic skeleton, an epoxy group on the ring, and an unsaturated bond A photosensitive resin composition comprising a copolymer (A1) with an aliphatic polycyclic epoxy compound (a2) having a polymer, a polymer (A2) other than (A1), and a polymerization initiator. As well as a cured product thereof. [Selection figure] None |
| priorityDate | 2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 268.