| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7feb5f21170170f9d5faa4b06756d874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18c6cfc6d233bcbc6b3668a508efdb12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1facff11c74801421334a59851ec009b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5783a7a19d175409e79c32dee7015004 |
| publicationDate |
2011-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011133679-A |
| titleOfInvention |
Negative radiation sensitive composition, cured pattern forming method and cured pattern |
| abstract |
A negative radiation sensitive composition capable of forming a cured pattern having a low relative dielectric constant, a cured pattern forming method using the same, and a cured pattern obtained by the cured pattern forming method are provided. A negative radiation sensitive composition comprising (A) a polymer, (B) a radiation sensitive acid generator and (C) a solvent, wherein the polymer (A) comprises (a1) Hydrolyzing and condensing at least one hydrolyzable silane compound selected from the hydrolyzable silane compound represented by the general formula (1) and (a2) the hydrolyzable silane compound represented by the following general formula (2) When the total of all the structural units contained in the polymer (A) is 100 mol%, the content ratio of the structural unit derived from the compound (1) is 80 to 100 mol%. A negative radiation sensitive composition. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102505090-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017145809-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7143763-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180116287-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013080884-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11609499-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013080884-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016163174-A1 |
| priorityDate |
2008-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |