| abstract |
The present invention provides a negative resist composition that is less prone to bridging during pattern formation and can provide high resolution, and a pattern forming method using the same. A negative resist composition comprising at least (A) a base polymer that is alkali-soluble and becomes alkali-insoluble by the action of an acid, (B) an acid generator, and (C) a basic component, The base polymer includes at least an acrylate unit having a phenolic hydroxyl group in the side chain and an acrylate repeating unit having an epoxycyclohexyl group, and has a weight average molecular weight of 1,000 to 10,000 having acid crosslinkability between the polymers. A negative resist composition comprising a polymer compound. [Selection figure] None |