http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011118419-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate | 2011-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_234f320334f9a97fe9e39a3fe7148a86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f63ac6079ae56e9ef47530cfb6f202 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d64e959480527574d8965bbe2262bc39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f89cf3de44d48c2eb2654befcd951f3 |
| publicationDate | 2011-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011118419-A |
| titleOfInvention | Chemically amplified resist composition, pattern forming method using the same, and photomask blank |
| abstract | A photolithography, especially KrF lasers for fine processing, ArF laser, F 2 laser, extreme ultraviolet rays, electron beams, in the lithography using X-ray as an exposure source, with high resolution, the substrate interface The present invention also provides a resist material such as a chemically amplified resist material that gives a good pattern shape, and a pattern forming method using the resist material. [MEANS FOR SOLVING PROBLEMS] An amine compound or amine oxide compound that has at least a carboxyl group and does not contain hydrogen covalently bonded to nitrogen that is a basic center (a compound in which the nitrogen atom of amine and amine oxide is contained in the ring structure of an aromatic ring) A chemically amplified resist composition containing 1 type or 2 types or more. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016035497-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016035497-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10095111-B2 |
| priorityDate | 2008-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 922.