http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011112823-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-32 |
| filingDate | 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b150769596bad1eb8c44091069f9392b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d32c286d5b6f2f328c18f930e3e1c044 |
| publicationDate | 2011-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011112823-A |
| titleOfInvention | Radiation sensitive resin composition, interlayer insulating film of liquid crystal display element, protective film and spacer, and method for forming them |
| abstract | It is possible to form an interlayer insulating film, a protective film and a spacer with one kind of radiation-sensitive resin composition. In the interlayer insulating film and the protective film, high sensitivity, high flatness, high adhesion, high High resolution and high sensitivity can be achieved for the transmittance and spacer, and in the formation process, by using a photopolymerization initiator with low sublimation property, contamination of the baking furnace or photomask during exposure can be achieved. The object is to provide a radiation-sensitive resin composition capable of preventing contamination. (A) A polymer having a carboxyl group and having at least one selected from an epoxy group or a (meth) acryloyl group, (B) a polymerizable unsaturated compound, (C) The radiation sensitive composition containing the radiation sensitive polymerization initiator shown by General formula (1). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016079158-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015527303-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016079157-A |
| priorityDate | 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 333.