| abstract |
A resist composition having a good line width roughness (LWR) of an obtained pattern is provided. A polymer having a structural unit derived from a monomer represented by the formula (I), an acid labile group, and insoluble or hardly soluble in an aqueous alkali solution, acting with an acid A resist composition comprising a resin (A) that can be dissolved in an alkaline aqueous solution and an acid generator. [In Formula (I), R 1 represents a hydrogen atom or a methyl group. R 2 represents an aromatic hydrocarbon group having 6 to 12 carbon atoms which may have a substituent. R 3 represents an optionally substituted hydrocarbon group having 1 to 12 carbon atoms or a cyano group, and the hydrocarbon group may include a hetero atom. A 1 represents a single bond or — (CH 2 ) m1 —CO—O— *, — (CH 2 ) m2 —OCO— (CH 2 ) m3 —CO—O— *. m1, m2, and m3 each represent an integer of 1-6. * Represents a bond with N. ] [Selection figure] None |