| abstract |
Provided is a chemically amplified positive resist composition that is particularly suitable for ArF excimer laser lithography and has good line edge roughness in addition to performance such as resolution, sensitivity, and pattern shape. A polymer that is insoluble or hardly soluble in an aqueous alkali solution, but becomes soluble in an aqueous alkali solution by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and the following formula (I A chemical amplification type positive resist composition, comprising: (Z is C 2-14, A is C 3-14, W is H, C 1-12 alkyl, C 2-12 alkylalkoxy or a group represented by formula (II). (X is a divalent linking group, R is H, C 1-6 alkyl or C 3-6 cycloalkyl. Y is an atom necessary for completing an alicyclic hydrocarbon group having 3 to 12 carbon atoms. l is 0 or 1. )) [Selection figure] None |