| abstract |
A novel compound useful as an acid generator for a resist composition, an acid generator comprising the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition To provide. A resist composition comprising a base material component (A) whose solubility in an alkaline developer is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure. The agent component (B) has the general formula (I) [wherein R 5 represents an organic group having a carbonyl group, an ester bond, or a sulfonyl group, and Q is a divalent linking group. ] The acid composition (B1) which consists of a compound which has group represented by this in the cation part is contained, The resist composition characterized by the above-mentioned. [Chemical 1] [Selection figure] None |