| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-55 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M1-00 |
| filingDate |
2009-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6944753641cb446cead234ffccabfa0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c177185dc66226e612d0d2da29dbce8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6840db2c976eb4edc007244f489e3c85 |
| publicationDate |
2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011085767-A |
| titleOfInvention |
Acid transfer composition, biochip manufacturing method, biochip and polymer |
| abstract |
The present invention provides an acid transfer composition, a biochip manufacturing method, and a biochip using the same, each having improved sensitivity to exposure and acid transferability. (A) A polymer having a naphthalene structure and (B) a radiation-sensitive acid generator are contained. The polymer (A) can have a structural unit (for example, using 4-methoxy-1-acryloyloxynaphthalene as a monomer). (A) forming a first film with a first compound having an acid dissociable group, (b) forming a second film using the acid transfer composition, and (c) exposing the second film. Removing the protecting group from the first molecule constituting the exposed portion of the first film, (d) removing the second film, and (e) applying the second compound to the first molecule at the site where the protecting group has been removed. Combining. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947393-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017071782-A |
| priorityDate |
2009-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |