http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011085698-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2009-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e614c28ecf21471b20d54b72a4048e4 |
| publicationDate | 2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011085698-A |
| titleOfInvention | Photo resist |
| abstract | Provided is a photoresist capable of forming a halftone pattern, which has excellent shape retention during post-baking and can be used for processing a display element substrate by a 4-mask method, which is excellent in plasma processability. A photoresist contains an alkali-soluble resin (A), a radiation sensitive compound (B), and organic fine particles (C). [Selection figure] None |
| priorityDate | 2009-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 281.