| abstract |
An object of the present invention is to provide a photosensitive resin having a low temperature curing property and an excellent pattern forming property, and a method for forming a cured relief pattern. A resin composition containing a polymer compound having a repeating unit represented by the following general formula (1A) or (1B) and a benzoxazine compound. Here, Ar < 1 >, Ar < 2 >, Ar < 4 > represents a C6-C30 trivalent organic group each independently, and this organic group may be substituted by the substituent. Ar 3 represents a divalent to hexavalent organic group having 6 to 30 carbon atoms, and the organic group may be substituted with a substituent. Y 1 , Y 2 , Y 3 and Y 4 each independently represent an acidic group protected with an acidic group or an acid-decomposable group. Z represents a linking group and may form a ring with at least one of Ar 1 and Ar 2 . a, b and f each independently represents an integer of 1 to 4; c represents an integer of 0 to 4. n1 and n2 are the number of repetitions and are 2 to 3000. [Selection figure] None |