http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011068095-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-135
filingDate 2009-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ea73a9b57c77dc8c7061ed208764702
publicationDate 2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011068095-A
titleOfInvention Nozzle plate manufacturing method, nozzle plate and inkjet head
abstract A nozzle plate having excellent ink resistance is manufactured. A termination process for performing a hydrogen termination process or a halogen termination process on a surface of a nozzle plate 60 including a nozzle discharge surface 60A and a nozzle inner wall surface using a silicon-based material including Si atoms at least in part of the surface. Organic water repellent having an unsaturated bond at the terminal and having a water repellent functional group on the nozzle plate 60 while applying light energy only to the nozzle ejection surface 60A of the nozzle plate 60 after the process and the termination process A water repellent film forming step of selectively forming a water repellent film Y by Si—C bonding on the nozzle discharge surface 60A by contacting the film raw material, and thermal energy 62 is applied to the nozzle plate 60 after the water repellent film forming step. On the other hand, an organic hydrophilic film material having an unsaturated bond at the end and having a hydrophilic functional group is brought into contact with the nozzle plate 60, so that S in addition to the nozzle discharge surface 60A. Containing a hydrophilic film forming step of forming a hydrophilic film Z by -C bond. [Selection] Figure 6
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