http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011054906-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
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filingDate 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a40d349f03617619ed73ebcb7fd90686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32323f684c69639aff658db33434821b
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publicationDate 2011-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011054906-A
titleOfInvention Slurry storage method and storage container
abstract PROBLEM TO BE SOLVED: To provide a method for stably storing a slurry in which tetravalent metal hydroxide particles are dispersed in water without changing pH. This slurry is used for polishing in the step of planarizing the substrate surface in the production of semiconductor elements. A method of storing a slurry containing water and tetravalent metal hydroxide particles dispersed in water in a container, without bringing the carbon dioxide absorbent into direct contact with the slurry in the container. Preferably, the carbon dioxide absorbent is preferably packaged with a packaging material having at least a part of water resistance and gas permeability. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102382508-B1
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priorityDate 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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