http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053606-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f9496034d4403d25d488eaf2f4029c4 |
| publicationDate | 2011-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011053606-A |
| titleOfInvention | Resist composition and pattern forming method |
| abstract | An object of the present invention is to provide a resist composition capable of producing a resist pattern with good sensitivity. A photo radical generator, an acid generator, a resin having an acid labile group and insoluble or hardly soluble in an alkaline aqueous solution, and the resin that has reacted with an acid dissolves in the alkaline aqueous solution. And (1) a step of applying this resist composition on a substrate, (2) a step of forming a composition layer by removing the solvent from the composition after application, (3) Pattern formation including a step of exposing the composition layer using an exposure machine, (4) a step of heating the composition layer after exposure, and (5) a step of developing the composition layer after heating using a developing device. Method. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012230320-A |
| priorityDate | 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 315.