http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053359-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4720345760f0e6b52bbc88491b83d43f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4cccdd0cb4abc5b997fdf3bf90ac0e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5bbfcfa5a1554cb73718379f67b0a1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d9e10ca36040d829cb7d7a7b071f6d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb0898a5dcb08643e4ed17bba19d7c04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef30be3acc8ca4bd4fabfb861f7c9c06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4e1a9676461b001af470dead7e1e992 |
| publicationDate | 2011-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011053359-A |
| titleOfInvention | Negative radiation sensitive resin composition |
| abstract | Chemically amplified negative type that can effectively form EB (electron beam) or EUV (extreme ultraviolet), has excellent roughness, etching resistance, and sensitivity, and can stably form a high-precision fine pattern. To provide a radiation sensitive resin composition capable of forming a resist film. The following general formula (1) or (2) (R independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and X represents independently from each other 1 to 8 carbon atoms. An at least one R represents an alkyl group having 1 to 8 carbon atoms.), An arene compound (A), a crosslinking agent (B), an acid generator (C), an acid diffusion A negative radiation-sensitive resin composition containing a control agent (D) and a solvent (E) is provided. [Selection figure] None |
| priorityDate | 2009-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 255.