http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011041894-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d610873487d2bc9668c04d7c2ec8e6c |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-58 |
filingDate | 2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2addf8911088bc0e128cf44a6966347 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76fed23d0186f26c8a564d3b2c362cb5 |
publicationDate | 2011-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2011041894-A |
titleOfInvention | Exhaust gas treatment method and detoxifying agent |
abstract | The present invention provides an exhaust gas treatment method and an exhaust gas treatment method capable of effectively detoxifying a hydrazine derivative contained in exhaust gas discharged from a semiconductor manufacturing process, and an exhaust gas treatment method. An exhaust gas containing hydrazine or a hydrazine derivative is brought into contact with a detoxifying agent containing iron (III) oxide as a main reaction component. In particular, organic substances contained in exhaust gas are obtained by first contacting exhaust gas containing at least one of an organometallic compound, amine compound, and volatile inorganic hydride with the abatement agent to detoxify hydrazine or a hydrazine derivative. Detoxification treatment of metal compounds, amine compounds and volatile inorganic hydrides can be performed reliably. [Selection figure] None |
priorityDate | 2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.