| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dde84b9898a552d710f9b67a6a1db2a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2867bf1c2a8e471fbf5ff43f68fe9273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3b10024b9fe3eb940006e1ae7cc8b26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ebf2da911cb7d1dd07c58c81484e7d0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J47-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J45-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J47-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J45-00 |
| filingDate |
2010-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36cda961ce935af24cc7c9b6718da2b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09c762bd7d8810abe058c95725510515
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7b9ec7b1654c4130be5b99cd1f211d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f64f9fa43b5223da980abcfb0621dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f3ba4443eb4d7d6c866347e9295741f |
| publicationDate |
2011-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2011003920-A |
| titleOfInvention |
Method for refining semiconductor polishing slurry |
| abstract |
[PROBLEMS] To suppress the pH change of a polishing slurry after purification with respect to the pH of the polishing slurry before purification. When the polishing slurry to be purified is acidic, the acid type end group of the functional group having the metal chelate forming ability in the chelate-forming fiber is set to the acid type (H type), and the polishing slurry to be purified is alkaline. The liquid-passing treatment is performed with the acid type terminal group of the functional group having the metal chelate forming ability in the chelate-forming fiber as an alkali metal salt or an ammonium salt. [Selection] Figure 7 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019131629-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019131629-A1 |
| priorityDate |
2003-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |