| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1805 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2009-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2010-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010538155-A |
| titleOfInvention |
Copolymer for resist containing photoacid generator and method for producing the same |
| abstract |
A resist copolymer containing a photoacid generator and a method for producing the same are provided. A copolymer that can be used as a resist for AFM lithography or a resist for electron beam lithography, and a method for producing the same, and has excellent solubility and coating properties in an organic solvent, and is capable of further improving pattern formation in a lithography process. A copolymer containing a photoacid generator of an alkylsulfonium salt and a method for producing the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014019741-A |
| priorityDate |
2008-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |