http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010535429-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
filingDate | 2008-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2010535429-A |
titleOfInvention | Low volatility compounds for use in forming deposited layers |
abstract | The present invention relates to the use of low volatility compounds in the formation of deposited layers and methods for achieving such deposition. Particular applicability is in the field of deposited layers for semiconductor devices. A solution consisting of a low vapor pressure solute (raw material) and a solvent having a vapor pressure several orders of magnitude lower than the vapor pressure is described. This solution is introduced into a vaporizer configured to allow rapid and efficient vaporization of the solute while minimizing solvent evaporation and solute decomposition. [Selection figure] None |
priorityDate | 2007-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.