Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11C13-0004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
filingDate |
2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2010-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2010534934-A |
titleOfInvention |
Compositions and methods for chemically and mechanically polishing phase change materials |
abstract |
The present invention provides a chemical mechanical polishing (CMP) composition suitable for polishing a substrate comprising a phase change material (PCM) such as a germanium-antimony-tellurium (GST) alloy. The composition comprises a particulate abrasive in combination with lysine, optionally an oxidizing agent, and their aqueous carrier. A CMP method for polishing a phase change material containing substrate utilizing the composition is also disclosed. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013047734-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013080751-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014225517-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013247341-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015528842-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9631121-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013179721-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013047733-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013179718-A1 |
priorityDate |
2007-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |