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filingDate 2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010508443-A
titleOfInvention Tin oxide based sputtering target, low resistance transparent conductive coating, method for producing such coating and composition for use in the conductive coating
abstract The present invention consists essentially of: a) about 60 to about 99 mol% SnO 2 and b) about 1 to about 40 mol% i) Nb 2 O 5 ii) NbO, iii) NbO 2 , iv) WO 2 , v) a) a mixture of MoO 2 and Mo and b) a material selected from the group consisting of Mo, vi) W, vii) Ta 2 O 5 , and viii) from the group consisting of those mixtures It is composed of one or more selected materials, wherein mol% is based on the total product and the sum of component a) and component b) is 100. The present invention also relates to a sintered product of such a composition, a sputtering target made from the sintered product, and a transparent conductive coating made from the composition.
priorityDate 2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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