| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C57-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-757 |
| filingDate |
2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad4303c08fb17c1a005bd6b4d636e7ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1573f9f8e810d85fbd182b51a2bc5cef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34c048bfb60bc26bcc422879e1bccd02 |
| publicationDate |
2010-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010275431-A |
| titleOfInvention |
Radiation sensitive resin composition, polymer used therefor and compound used therefor |
| abstract |
The present invention provides a radiation sensitive resin composition capable of forming a resist pattern having a small LWR and an excellent pattern shape. A radiation-sensitive resin composition comprising (A) a polymer having a specific COO - structure in the side chain and (B) a radiation-sensitive acid generator is provided. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015091952-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011180185-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011037834-A |
| priorityDate |
2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |