http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010275388-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_32ce12f8709350afe097badddf523729 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D273-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2009-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_219b8e0109a8936d478fbde46ebe7adc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76b0ace860b3721430f008346c97c61a |
| publicationDate | 2010-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010275388-A |
| titleOfInvention | Photobase generator, photosensitive resin composition using the same, and circuit board using the same |
| abstract | The present invention provides a photobase generator that achieves both improved photosensitivity and improved heat stability by increasing the light absorption wavelength. By using the photobase generator, conventional photobase generation is provided. A photosensitive resin composition capable of improving the mechanical properties of a film, which has been difficult with an agent, and a circuit board using the same. The photobase generator of the present invention is a compound containing an acyloxyimino group represented by the formula (1), and the photosensitive resin composition of the present invention comprises a photobase generator ( A) a photosensitive resin composition containing a polyamic acid (B), wherein the photobase generator is a compound containing an acyloxyimino group represented by the formula (1). And [Chemical 1] (In the formula, X 1 is a divalent organic group, n represents an integer of 1 to 5. R 1 represents an aromatic group or an alkyl group having 1 or more carbon atoms.) [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111393379-A |
| priorityDate | 2009-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.