http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010270291-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-00
filingDate 2009-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6db31ce61fdcaa86e3b8e1df925649c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2609771a1b2b2d9316dc8023cce6f94
publicationDate 2010-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010270291-A
titleOfInvention Water repellent layer manufacturing method, water repellent film manufacturing method, water repellent layer and water repellent film
abstract PROBLEM TO BE SOLVED: To provide a method for producing a water-repellent layer capable of producing a water-repellent layer having excellent water repellency with simple conditions and equipment without performing evacuation or gas replacement. A method for producing a water-repellent layer according to the present invention is a method for producing a water-repellent layer containing fluorine, in a gas containing fluorine atoms and hydrogen atoms, and a gas containing an inert gas under atmospheric pressure. A fluorine-containing layer forming step of forming a fluorine-containing layer by plasma discharge treatment, and a solvent treatment step of bringing a solvent into contact with the surface of the fluorine-containing layer, wherein the fluorine-containing layer forming step in the gas The ratio (X / Y) of the number of fluorine atoms (X) and the number of hydrogen atoms (Y) is 8 or less. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5626441-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014188852-A
priorityDate 2009-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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