http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010240854-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-135
filingDate 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f071fdaf8e009713bf1a85964fb41a47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4d4eeb56f0523d9f45170861b1a1cce
publicationDate 2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010240854-A
titleOfInvention Nozzle substrate manufacturing method and droplet discharge head manufacturing method
abstract [PROBLEMS] To improve the hydrophilicity of an inner wall of a nozzle hole by suppressing the ink repellent film and the primer liquid from entering the nozzle hole during the production of the nozzle substrate. A step of dry etching a silicon substrate to form a portion to be a nozzle hole, a step of forming an oxide film on a surface of the silicon substrate on which the portion to be a nozzle hole is formed, and a nozzle A step of filling the portion that becomes the hole 10 with the soluble resin 201, a step of bonding the support substrate 103 to the processed surface of the nozzle hole 10 of the silicon substrate 1, and a side opposite to the surface on which the support substrate 103 is bonded. The silicon substrate 1 is ground and polished from the surface to be thinned and penetrated through the nozzle holes 10, the ink repellent film 12 is formed on the ground and polished surface of the silicon substrate 1, and the support substrate 103 is peeled off. A method of manufacturing a nozzle substrate, comprising: a step of primer-treating the surface of the ink-repellent film 12 of the silicon substrate 1; and a step of removing the soluble resin 201 from the nozzle holes 10. [Selection] Figure 5
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018069685-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6990971-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017185748-A
priorityDate 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.