| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36616a7dfdb0a7e59c6f4b808e61f918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5274201dd3cdbfb3b87410e86dbb2323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate |
2010-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010237656-A |
| titleOfInvention |
Chemically amplified photoresist composition and pattern forming method |
| abstract |
An object of the present invention is to provide a chemically amplified photoresist composition capable of forming a pattern having excellent resolution and line edge roughness and which does not cause pattern collapse. A chemically amplified photoresist composition comprising an acid generator (A) and a resin (B), wherein the resin (B) has at least (b1) a carboxyl group produced by the action of an acid. A structural unit that is soluble in an alkaline developer, a structural unit containing an adamantyl group having at least two (b2) -OX a groups (X a represents a group capable of leaving by the action of an acid), and ( b3) A chemically amplified photoresist composition comprising a structural unit derived from a monomer having a lactone ring. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011197339-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013064880-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011215333-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053430-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130010859-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101973815-B1 |
| priorityDate |
2009-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |