http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010229029-A

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filingDate 2010-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e203b5a44b5f370d39ad2f4eb3ef932
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publicationDate 2010-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010229029-A
titleOfInvention Synthetic quartz glass ingot and method for producing synthetic quartz glass member
abstract In producing a synthetic quartz glass ingot by a direct method in which silica raw material compound is vapor-phase hydrolyzed or oxidatively decomposed by a flame formed by a burner to deposit silica fine particles on a target and melt vitrify. In the method of growing the ingot by moving the target forward and backward, (ii) while continuously supplying a fixed amount of the silica raw material compound, (ii) the entire growth surface is always irradiated with the flame, and (iii) the target (Iv) A method for producing a synthetic quartz glass ingot, characterized in that a synthetic quartz glass ingot is obtained by periodically repeating the forward and backward movements at a predetermined time, a predetermined speed, and a predetermined growth rate, and (iv) maintaining the ingot growth shape constant. . [Effect] For example, a low striae synthetic quartz glass member for a large synthetic quartz glass substrate used for a large photomask for liquid crystal display and a method for producing a synthetic quartz glass ingot for obtaining the same. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9284213-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013133277-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7060386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018184335-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018198774-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014514236-A
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